Pascal and Francis Bibliographic Databases

Help

Search results

Your search

kw.\*:("Méthode CVD")

Document Type [dt]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Language

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 25 of 419

  • Page / 17
Export

Selection :

  • and

Demonstration of a method to fabricate a large-area diamond single crystalPOSTHILL, J. B; MALTA, D. P; HUDSON, G. C et al.Thin solid films. 1995, Vol 271, Num 1-2, pp 39-49, issn 0040-6090Article

Time-dependent dielectric breakdown measurements on RPECVD and thermal oxidesSILVESTRE, C; HAUSER, J. R.Thin solid films. 1996, Vol 277, Num 1-2, pp 101-114, issn 0040-6090Article

Piezoelectricity in aromatic polyamide thin films prepared by vapor deposition polymerizationLINFORD, M. R; IIJIMA, M; HATTORI, T et al.Japanese journal of applied physics. 1996, Vol 35, Num 2A, pp 677-678, issn 0021-4922, 1Article

Preparation of micro-coiled TiC fibers by metal impurity-activated chemical vapor depositionMOTOJIMA, S; IWANAGA, H.Materials science & engineering. B, Solid-state materials for advanced technology. 1995, Vol 34, Num 2-3, pp 159-163, issn 0921-5107Article

Mise au point d'un système d'analyse in situ par spectrométrie de masse de la phase gazeuse pour le dépôt chimique en phase vapeur = On site gas mass spectrometer set-up for CVD reactorTHOMAS, N; BLANQUET, E.Le Vide (1995). 1995, Vol 51, Num 278, issn 1266-0167, 367, 393-408 [17 p.]Article

Growth rate modeling for selective tungsten LPCVDWOLF, H; STREITER, R; SCHULZ, S. E et al.Applied surface science. 1995, Vol 91, pp 332-338, issn 0169-4332Conference Paper

Design and fabrication of a double bandstop rugate filter grown by plasma-enhanced chemical vapor depositionLIM, S; SHIH, S; WAGER, J. F et al.Thin solid films. 1996, Vol 277, Num 1-2, pp 144-146, issn 0040-6090Article

Measurements of specific heat and mass density in CVD diamondGRAEBNER, J. E.Diamond and related materials. 1996, Vol 5, Num 11, pp 1366-1370, issn 0925-9635Article

Advances and development in CVD technologyHINTERMANN, H. E.Materials science & engineering. A, Structural materials : properties, microstructure and processing. 1996, Vol 209, Num 1-2, pp 366-371, issn 0921-5093Conference Paper

Study of color centers in hot-filament CVD diamond films by cathodoluminescence and photoluminescence and their correlations with film qualityLIN, L.-T. S; POPOVICI, G; MORI, Y et al.Diamond and related materials. 1996, Vol 5, Num 11, pp 1236-1245, issn 0925-9635Article

Effect of rapid thermal annealing on the optical and structural properties of highly strained InAs/InP quantum well structuresXING, Q. J; BREBNER, J. L; LUO, X. M et al.Solid state communications. 1996, Vol 98, Num 11, pp 1009-1014, issn 0038-1098, 5 p.Article

Influence of mixed reductants on the growth rate of WF6-based W-CVDJONGSTE, J. F; OOSTERLAKEN, T. G. M; LEUSINK, G. J et al.Applied surface science. 1995, Vol 91, pp 162-168, issn 0169-4332Conference Paper

Wide web coating of complex materialsLIEVENS, H.Surface & coatings technology. 1995, Vol 76-77, Num 1-3, pp 744-753, issn 0257-8972, 2Conference Paper

Precursor development for the chemical vapor deposition of aluminium, copper and palladiumGRÄFE, A; HEINEN, R; KLEIN, F et al.Applied surface science. 1995, Vol 91, pp 187-191, issn 0169-4332Conference Paper

Microstructure and properties of Ti-Si-N films prepared by plasma-enhanced chemical vapor depositionHE, J. L; CHEN, C. K; HON, M. H et al.Materials chemistry and physics. 1996, Vol 44, Num 1, pp 9-16, issn 0254-0584Article

An electron paramagnetic resonance investigation of paramagnetic defects in diamond films grown by chemical vapour depositionTALBOT-PONSONBY, D. F; NEWTON, M. E; BAKER, J. M et al.Journal of physics. Condensed matter (Print). 1996, Vol 8, Num 7, pp 837-849, issn 0953-8984Article

Graphite film formation by chemical vapor deposition on Ni coated sapphireYUDASAKA, M; KIKUCHI, R; MATSUI, T et al.Carbon (New York, NY). 1996, Vol 34, Num 6, pp 763-768, issn 0008-6223, 5 p.Article

Epitaxy in multilayer coatings of κ-Al2O3HALVARSSON, M; VUORINEN, S.Surface & coatings technology. 1996, Vol 80, Num 1-2, pp 80-88, issn 0257-8972Conference Paper

Simulation of homoepitaxial growth on the diamond (100) surface using detailed reaction mechanismsRUF, B; BEHRENDT, F; DEUTSCHMANN, O et al.Surface science. 1996, Vol 352-54, pp 602-606, issn 0039-6028Conference Paper

New forms of luminescent silicon : silicon-silica composite mesostructuresCHOMSKI, E; DAG, Ö; KUPERMAN, A et al.Advanced materials (Weinheim). 1996, Vol 8, Num 1, pp 8-13, issn 0935-9648Article

Diamond synthesis by thermal plasma chemical vapour deposition (TP-CVD)PRESIA, M; HEIDER, T; SCHLEICHER, L et al.Crystal research and technology (1979). 1996, Vol 31, Num 2, pp 165-170, issn 0232-1300Article

Optical properties of Zn1-xCdxSe-ZnSe superlattices grown by metal organic vapour phase epitaxyABOUNADI, A; RAJIRA, A; CLOITRE, T et al.Materials science & engineering. B, Solid-state materials for advanced technology. 1996, Vol 40, Num 1, pp 80-88, issn 0921-5107Article

Structural characterization of PbTiO3 thin films prepared by ion beam induced CVD and evaporation of leadLEINEN, D; CABALLERO, A; FERNANDEZ, A et al.Thin solid films. 1996, Vol 272, Num 1, pp 99-106, issn 0040-6090Article

Dominant SiHx radicals in electron cyclotron resonance plasma CVDZHANG, M; NAKAYAMA, Y.Plasma sources science & technology (Print). 1996, Vol 5, Num 2, pp 260-264, issn 0963-0252Conference Paper

Microscopic measurements of the local heat conduction in polycrystalline diamond filmsPLAMANN, K; FOURNIER, D; FORGET, B. C et al.Diamond and related materials. 1996, Vol 5, Num 6-8, pp 699-705, issn 0925-9635Conference Paper

  • Page / 17